PXRMS Multilayer Survey Results: \w*



Materials d(nm) Gamma N Grazing Angle (deg) lambda (nm) R(%) Deposition Contact Affiliation Reference
Ni/C 13 0.23 18 0.42 0.154 95 Evaporate Spiga D. et al. Osservatorio di Brera / Merate - Media Lario s.r.l. Thickness data taken from a fit of reflectivity scan
Ru/B4C 4.2 0.57 65 0.42 0.059 92.4 Other Ch. Morawe ESRF, France
Ni/BN 5.5 0.40 50 0.8 0.154 90 Ion Beam Sputter Jim Wood, Y.Platonov Osmic, Inc.
Pt/C 9.3 0.35 20 0.56 0.1541 87 Evaporate D. Spiga et al. Brera-Merate Astronomical Observatory / Media-Lario s.r.l. Data taken from a fit of a reflectivity scan
W/C 5 5 100 .7107 85 Magnetron Sputter tian yuhong
W/Si 9.7 0.7 60 4.5 0.154 84 Magnetron Sputter T. H. Metzger University Munich T. Salditt et al Phys. Rev. B 54,5860(1996)
Mo/Si 9 0.50 161 45 12.8 83 Magnetron Sputter M Yamamoto Tohoku Univ., Japan Proc. SPIE Vol. 1720, 233 (1992)
Pt/C 9.3 0.33 20 0.56 0.154 83 Evaporate D. Spiga et al. INAF/Brera Astronomical Observatory and Media-Lario techn. Proc. SPIE Vol. 5488, p. 813-819
WSi2/Si 3.7 0.189 400 1.19 0.154 80.2 Magnetron Sputter Ray Conley APS/NSLSII Grown in rotary deposition system at APS
W/C 3 0.30 200 1.5 0.154 80 Ion Beam Sputter Jim Wood, Y.Platonov Osmic, Inc.
W/Si 6.6 0.39 70 0.67 0.154 80 PEMS Eric Ziegler ESRF, France
Ni/B4C 2.4 0.50 200 1.86 0.154 79.3 Other Ch. Morawe ESRF, France
Ru/Al2O3 4.1 0.41 80 1.14 0.154 72.0 Other Ch. Morawe ESRF, France
Mo/Si 6.885 0.35 60 67.51 12.52 71.4 Magnetron Sputter Stefan Braun, Hermann Mai, Matt Moss, Andreas Leson IWS Dresden The multilayer contains B4C and C barrier layers. The reflectivity was measured at PTB/BESSY2 in January 2002.
Mo/Si 6.89 0.34 60 70 12.73 71.05 Magnetron Sputter Sasa Bajt LLNL Measured in July 2001, Presented at SPIE conference (Soft X-ray and EUV Imaging Systems) in San Diego, SPIE Vol. 4506
Mo/Si 6.89 0.34 50 85 12.75 70.9 Magnetron Sputter S. Bajt Lawrence Livermore National Laboratory Multilayer contains B4C diffusion barriers. The measurement was done at the ALS beamline in summer 2001.
Mo/Si 6.97 0.38 60 70 12.8 70.6 Magnetron Sputter Sasa Bajt Lawrence Livermore National Laboratory Measured at CXRO/ALS June 2001. The multilayer contains diffusion barrier layers.
Mo/Be 5.74 .42 70 85 11.34 70.2 Magnetron Sputter Sasa Bajt LLNL C. Montcalm, S. Bajt, P. Mirkarimi, E. Spiller, F. Weber, J. Folta, SPIE Vol. 3331 (1998)
Mo/Si 6.89 0.34 50 85 13.45 70.0 Magnetron Sputter Sasa Bajt LLNL SPIE talk July 31, 2001, San Diego, SPIE Proc. Vol. 4506-12, using diffusion barriers
W/Si 2.5 0.28 150 1.8 0.154 70 Magnetron Sputter Jim Wood, Y.Platonov Osmic, Inc.
Mo/Si 6.885 0.35 60 88.5 13.42 69.7 Magnetron Sputter Stefan Braun, Hermann Mai, Matt Moss IWS Dresden measured at PTB/BESSY2, Dec. 2001 (the multilayer contains C and B4C barrier layers)
Mo/Si 6.97 0.38 60 85 13.5 69.6 Magnetron Sputter Sasa Bajt Lawrence Livermore National Laboratory Measured at CXRO/ALS June 14, 2001. The multilayer contains diffusion barrier layers.
Mo/Si 6.65 0.4 50 88.5 13.0 69.5 Evaporate Ion Polish Eric Louis, Andrey Yakshin, Peter Gorts, Fred E. Louis, A.E. Yakshin, S. Oestreich, F.Bijkerk FOM Rijnhuizen, the Netherlands E. Louis et al. Progress in Mo/Si multilayer coating technology for EUVL optics SPIE 3997 (Micro Lithography) Santa Clara 2000
Mo/Si 6.86 0.41 50 67.25 12.52 69.4 Magnetron Sputter Stefan Braun, Hermann Mai, Matthew Moss Fraunhofer IWS Dresden, Germany measured at PTB/BESSY II
Mo/Si 6.89 0.38 60 88.5 13.45 68.8 Magnetron Sputter Sergiy Yulin, Torsten Feigl, Thomas Kuhlmann, Norbert Kaiser Fraunhofer IOF Jena, Germany measured at PTB Berlin/BESSY II
Mo/Si 6.85 0.41 60 85 13.4 68.7 Magnetron Sputter Claude Montcalm LLNL C. Montcalm, J. A. Folta and S. P. Vernon, "Pathways to high reflectance Mo/Si multilayer coatings for extreme-ultraviolet lithography," presented at the 4th International Conference on The Physics of X-Ray Multilayer Structures, March 1-5, 1998, Breckenridge, Colorado, USA
Mo/Si 6.82 0.39 60 88.5 13.39 68.7 Magnetron Sputter Stefan Braun, Hermann Mai, Matt Moss Fraunhofer IWS Dresden, Germany measured at PTB/BESSY2, June 2001
Mo/Si 6.5 0.4 50 88.5 12.75 68.6 Evaporate Ion Polish Eric Louis, Andrey Yakshin, Peter Gorts, Fred Bijkerk FOM-Rijnhuizen E. Louis et al; Reflectivity of Mo/Si multilayer systems for EUVL. Proceedings SPIE 3676, Santa Clara, March 1999
Mo/Be 5.8 0.40 70 85 11.4 68 Magnetron Sputter Ken Skulina LLNL Applied Optics Vol. 34, 3727 (1995)
Mo/Si 7.29 0.36 50 88.5 14.1 67.5 Evaporate Ion Polish Eric Louis, Andrey Yakshin, Peter Gorts, Fred Bijkerk FOM-Rijnhuizen, The Netherlands E. Louis et al; Reflectivity of Mo/Si multilayer systems for EUVL. Proceedings SPIE 3676, Santa Clara, March 1999
Mo/Si 6.85 0.41 40 85 13.4 67.5 Magnetron Sputter Claude Montalm LLNL J.A. Folta et al., Advances in multilayer reflective coatings for extreme ultraviolet lithography, Proceedings of SPIE Vol. 3676, paper 3676-88 (1999).
Mo2C/Si 6.51 0.4 60 88.5 12.8 66.8 Magnetron Sputter Sergey Yulin, Torsten Feigl, Thomas Kuhlmann, Norbert Kaiser Fraunhofer IOF Jena, Germany measured at PTB/BESSY II
Mo/Si 6.75 0.45 50 88.5 13.27 66.3 Ion Beam Sputter Markus Haidl Carl Zeiss measured at PTB/BESSY II substrate: Si (100)
Mo2C/Si 6.8 0.4 50 85 13.3 66 Magnetron Sputter Claude Montcalm LLNL
Mo/Si 6.8 0.41 40 89 13.2 66 Magnetron Sputter Daniel Stearns, Steve Vernon LLNL
Mo/Si 6.8 0.4 40 65.0 12.56 65.5 Evaporate Ion Polish Ulf Kleineberg University of Bielefeld Measured at ALS/CXRO beamline 6.3.2
W/Si 3.2 0.34 50 1.4 0.154 65 Magnetron Sputter B.Vidal Facult des Sciences de St. Jerome, France
W/Si 2.5 0.32 50 1.8 0.154 64 PEMS Eric Ziegler ESRF, France
Mo/Si 6,7 2,7 50 88,5 13,1 64,5 Ion Beam Sputter Horst Neumann, Thomas Chasse IOM Leipzig Germany Journals of the UNAXIS Company: Proximity Issue 2000-2001,34-35 Chip Issue 2000-2001
Mo/Si 6.7 0.40 40 85 13.4 63 Magnetron Sputter Ken Skulina LLNL
Ru/Be 5.8 0.40 70 85 11.4 63 Magnetron Sputter Ken Skulina LLNL Applied Optics Vol. 34, 3727 (1995)
Mo/Si 7 0.37 40 85 14 63 Magnetron Sputter David Windt ATT
Mo/Si 6.8 0.4 40 85 13.25 63.0 Evaporate Ion Polish Ulf Kleineberg University of Bielefeld Measured at ALS/CXRO beamline 6.3.2
La/B4C 8.0 0.33 50 25 6.76 62 Magnetron Sputter Yuriy Platonov Osmic, Inc.
La/B4C 8.0 0.39 30 25 6.76 62 Magnetron Sputter Yuriy Platonov Osmic, Inc.
Mo/Si 6.97 0.44 40 66.2 12.53 61.1 Pulsed Laser Deposit Stefan Braun, Reiner Dietsch, Thomas Holz, Hermann Mai Fraunhofer IWS Dresden measured at PTB/BessyI
Mo/Si 7 0.44 45 85 13.4 61 Magnetron Sputter Claude Montcalm, H. Pepin Natl. Res. Council Canada and INRS-Energy and Materials C. Montcalm, B.T. Sullivan, H. Pepin, J.A. Dobrowolski and M. Sutton, "Extreme-ultraviolet Mo/Si multilayer mirrors deposited by radio-frequency-magnetron sputtering," Appl. Opt. 33, 2057-2067 (1994).
Mo/C 2.8 0.39 100 1.6 0.154 60 Magnetron Sputter Jeff Kortright LBNL
Mo/Si 6.7 0.45 40 89 13 60 Magnetron Sputter Jim Wood, Y.Platonov Osmic, Inc.
W/B4C 1.7 0.35 200 2.6 0.154 60 Magnetron Sputter Jim Wood, Y.Platonov Osmic, Inc.
Re/B4C 1.7 0.35 200 2.6 0.154 60 Magnetron Sputter Jim Wood, Y.Platonov Osmic, Inc.
W/Si 3.7 0.27 56 1.2 0.154 60 PEMS Eric Ziegler ESRF, France
W/B4C 2.4 0.46 120 1.90 0.154 60.0 Other Ch. Morawe ESRF, France
Zr/Al 9.08 0.4 40 85 17.6 59.3 Magnetron Sputter Farhad Salmassi, Eric Gullikson CXRO LBNL
Ru/Si 6.8 0.41 40 89 13.1 58 Magnetron Sputter Daniel Stearns, Steve Vernon LLNL
Mo/Si 10 0.45 40 45 13 58 Magnetron Sputter Jim Wood, Y.Platonov Osmic, Inc.
Sc/Si 24.3 0.4 20 85 44.7 57 Magnetron Sputter Sergiy Yulin, Torsten Feigl, Norbert Kaiser Fraunhofer IOF Jena, Germany measured at BESSY II, using diffusion barriers
Ru/Si 7 0.37 40 85 14 55 Magnetron Sputter David Windt ATT
Sc/Si 19.1 0.5 10 89 36.5 54 Magnetron Sputter Igor A.Artioukov FIAN-KhSPU Yu.A. Uspenskii, V.E. Levashov, et al Optics Letters Vol. 23, 771 (1998)
Mo/Si 14 0.30 11 45 18.5 53 Magnetron Sputter Jon Slaughter, Charles Falco Univ. Arizona Slaughter, J.M.; Schulze, D.W.; Hills, C.R.; Mirone, A.; and others. Journal of Applied Physics, 15 Aug. 1994, vol.76, (no.4):2144-56.
Rh/Be 6.4 0.41 40 85 12.2 50 Magnetron Sputter Ken Skulina LLNL Applied Optics Vol. 34, 3727 (1995)
Mo/Sr 5.36 0.36 120 86.4 10.5 48.3 Magnetron Sputter Benjawan Sae-Lao LLNL Optics Letters, Vol. 26, No. 7 (April 2001)
Sc/Si 28.4 0.4 20 85 49.1 47 Magnetron Sputter Sergiy Yulin, Torsten Feigl, Norbert Kaiser Fraunhofer IOF Jena, Germany measured at BESSY II
Mo/Y 5.93 0.41 100 85 11.43 46.1 Magnetron Sputter Claude Montcalm LLNL C.Montcalm, B.T.Sullivan, S.Duguay, M.Ranger, and others. Optics Letters, 15 June 1995, 20, 1450-2.
Mo/Si 11.5 0.22 20 34 12.8 44 Magnetron Sputter Phillip Troussel Commissariat A L'Energie, France
Mo/La 5.98 0.45 30 5 11.74 44 Ion Beam Sputter Michael Hofstetter Ludwig Maximilians Universitaet Muenchen 3 nm B4C capping layer M Hofstetter, A Aquila, M Schultze, A Guggenmos, S Yang, E Gullikson, M Huth, B Nickel, J Gagnon, V S Yakovlev, E Goulielmakis, F Krausz and U Kleineberg New Journal of Physics 13 (2011) 063038
Sc/Si 24.0 0.5 10 89 42.0 42 Magnetron Sputter Igor A.Artioukov FIAN-KhSPU Yu.A. Uspenskii, V.E. Levashov, et al Optics Letters Vol. 23, 771 (1998)
Mo/La 5.72 0.45 36 5 11.32 41.3 Ion Beam Sputter Michael Hofstetter Ludwig Maximilians Universitaet Muenchen 3 nm B4C capping layer M Hofstetter, A Aquila, M Schultze, A Guggenmos, S Yang, E Gullikson, M Huth, B Nickel, J Gagnon, V S Yakovlev, E Goulielmakis, F Krausz and U Kleineberg New Journal of Physics 13 (2011) 063038
SiC/Mg 15.4 0.34 40 88 29.7 41 Magnetron Sputter Hisataka Takenaka NTT Advanced Technology Journal of Electron Spectroscopy and Related Phenomena 144-147, 1047-1049 (2005)
Mo/Sr 4.83 0.37 120 86.4 9.4 40.8 Magnetron Sputter Benjawan Sae-Lao LLNL Optics Letters, Vol. 26, No. 7 (April 2001)
Mo/Si 3.1 0.35 50 1.4 0.154 40 Magnetron Sputter B.Vidal Facult des Sciences de St. Jerome, France
W/C 7 0.30 100 7 0.834 40 Ion Beam Sputter Jim Wood, Y.Platonov Osmic, Inc.
Al&SiC/MgF2 28.4 0.43 1 90 92 39.8 Other Juan I. Larruquert NASA/GSFC Applied Optics Vol. 38, p. 1231-1236 (1999) The multilayers were Al (opaque, inner)/MgF2(16.3 nm)/SiC(12.1, outer) Al and MgF2 were deposited by evaporation SiC was deposited by ion beam sputtering
La/B4C 3.5 0.44 150 75 6.76 39.3 Magnetron Sputter Yuriy Platonov Osmic, Inc.
Al&B4C/MgF2 25.4 0.39 1 80 92 38.7 Other Juan I. Larruquert NASA/GSFC Applied Optics Vol. 38, p. 1231-1236 (1999) The multilayers were Al (opaque, inner)/MgF2(15.4 nm)/B4C(10.0, outer) Al and MgF2 were deposited by evaporation B4C was deposited by ion beam sputtering
Mo/Y 4.78 0.425 100 87 9.482 38.4 Magnetron Sputter Benjawan Sae-Lao LLNL Measured at ALS beamline 6.3.2 (2/8/2001)
Sc/Si 28.3 0.5 10 89 48.1 36 Magnetron Sputter Igor A.Artioukov FIAN-KhSPU Yu.A. Uspenskii, V.E. Levashov, et al Optics Letters Vol. 23, 771 (1998)
Sc/Si 21.6 0.4 20 85 42.0 36 Magnetron Sputter Sergiy Yulin, Torsten Feigl, Norbert Kaiser Fraunhofer IOF Jena, Germany measured at BESSY II
Cr/Sc 2.26 .4 150 43.7 3.116 36 Magnetron Sputter Naureen Ghafoor, Jens Birch, Andy Aquila, Eric Gullikson, Franz Schafers Linkoping University Measured at ALS and BESSY 2008
Ru/C 6 0.40 100 85 12 35 Magnetron Sputter Jeff Kortright LBNL
Mo/Y 4.95 0.51 100 85 9.71 34.7 Magnetron Sputter Claude Montcalm LLNL C.Montcalm, B.T.Sullivan, S.Duguay, M.Ranger, and others. Optics Letters, 15 June 1995, 20, 1450-2.
W/Si 3.3 0.45 40.5 12.3 1.34 34 Magnetron Sputter Cui Mingqi Institute of High Energy Physics,Academia Sinica,Beijing 100039,P.R.China Cui Mingqi,Physcis(in Chinese) Vol.25 (1996)32
Mo/Si 12.5 0.30 15 89 23.6 33 Magnetron Sputter Jon Slaughter, Charles Falco Univ. Arizona Slaughter, J.M.; Schulze, D.W.; Hills, C.R.; Mirone, A.; and others. Journal of Applied Physics, 15 Aug. 1994, vol.76, (no.4):2144-56.
B4C/Si 14 0.50 20 45 18.2 33 Magnetron Sputter Jon Slaughter, Charles Falco Univ. Arizona Slaughter, J.M.; Medower, B.S.; Watts, R.N.; Tarrio, C.; and others. Optics Letters, 1 Nov. 1994, vol.19, (no.21):1786-8.
Cr/Sc 1.576 0.4 400 80.8 3.114 32.1 Magnetron Sputter Farhad Salmassi, Eric Gullikson CXRO Measured July 2005 at ALS Multilayer includes diffusion barrier layers
Nb/Si 13.86 0.49 20.5 42 17.59 32 Magnetron Sputter Cui Mingqi Institute of High Energy Physics,Academia Sinica,Beijing 100039,P.R.China Cui Mingqi,Physcis(in Chinese) Vol.25 (1996)32
La/Mo 0.45 5.61 20 5 11.07 31.4 Ion Beam Sputter Michael Hofstetter Ludwig Maximilians Universitaet Muenchen 3 nm B4C capping layer; appr. 0.6 nm B4C barrier layers. M Hofstetter, A Aquila, M Schultze, A Guggenmos, S Yang, E Gullikson, M Huth, B Nickel, J Gagnon, V S Yakovlev, E Goulielmakis, F Krausz and U Kleineberg New Journal of Physics 13 (2011) 063038
Al2O3/C 9.65 0.21 15 13 4.36 31 Magnetron Sputter M. Veldkamp, H. Zabel, F. Schaefers, H.Ch. Mertins Ruhr-Universitaet Bochum, Lehrstuhl fuer Experimentalphysik/Festkoerperphysik, Universitaetsstr. 150, D-44780 Bochum, Germany Measurement taken at BESSY PM4 Submitted to Appl. Optics
W/C 3.2 0.50 60 13 1.5 30 Magnetron Sputter Remy Marmoret CEA, France
W/Si 3.2 0.50 60 13 1.5 30 Magnetron Sputter Remy Marmoret CEA, France
B4C/Si 19 0.50 15 45 23.6 30 Magnetron Sputter Jon Slaughter, Charles Falco Univ. Arizona Slaughter, J.M.; Medower, B.S.; Watts, R.N.; Tarrio, C.; and others. Optics Letters, 1 Nov. 1994, vol.19, (no.21):1786-8.
Mo/Si 11 0.40 40 89 21 30 Magnetron Sputter Daniel Stearns, Steve Vernon LLNL
W/C 4.2 0.40 100 9 1.2 30 Magnetron Sputter Phillip Troussel Commissariat A L'Energie, France
Al2O3/V 4.36 0.43 40 16 2.42 30 Magnetron Sputter M. Veldkamp, H. Zabel, F. Schaefers, H.-Ch. Mertins Ruhr-Universitaet Bochum, Lehrstuhl fuer Experimentalphysik/Festkoerperphysik, Universitaetsstr. 150, D-44780 Bochum Measurement taken at BESSY PM4 Submitted to Appl. Optics
W/Si 3.2 0.34 50 10 1.1 30 Magnetron Sputter B.Vidal Facult des Sciences de St. Jerome, France
Mo/B4C 9.4 0.30 75 40 12 30 Magnetron Sputter Jim Wood, Y.Platonov Osmic, Inc.
Cr/Sc 3.17 0.4 150 30.1 3.16 29.6 Magnetron Sputter Sergey Yulin, Thomas Kuhlmann, Torsten Feigl, Norbert Kaiser Fraunhofer IOF Jena, Germany measured at PTB/BESSY II
Rh/Si 6.8 0.41 40 89 13.4 29 Magnetron Sputter Daniel Stearns, Steve Vernon LLNL
Ni/C 5 0.50 41 64 4.4 29 Ion Beam Sputter M Yamamoto Tohoku Univ., Japan
Ir/Al 39 0.33 1 90 53.6 28.2 Evaporate Juan I. Larruquert Instituto de Fisica Aplicada-CSIC Reference: Proc. SPIE Vol. 4139, p. 102-109 (2000) The multilayer was Ir(13 nm, inner)/Al(26 nm)/ Ir(7.5 nm, outer)
Zr/Al 13 0.40 20 85 25.8 28 Magnetron Sputter Jeff Kortright LBNL
W/Si 9 0.50 51 43 12.9 28 Magnetron Sputter M Yamamoto Tohoku Univ., Japan
B4C/Si 6.8 0.50 70 85 13.1 27.5 Magnetron Sputter Jon Slaughter, Charles Falco Univ. Arizona Slaughter, J.M.; Medower, B.S.; Watts, R.N.; Tarrio, C.; and others. Optics Letters, 1 Nov. 1994, vol.19, (no.21):1786-8.
Pd/C 5 0.38 30 85 10.6 27 Evaporate Ion Polish Eric Louis FOM Inst. Plasma Phys., Netherlands
C/Si 16.8 .32 30 86 30.4 25 Ion Beam Sputter Marius Grigonis Universite Laval, Quebec, Canada Marius Grigonis and Emile Knystautas Applied Optics 36, 2839 (1997)
Ni/C 3.91 0.45 75 34.85 4.47 23.4 Pulsed Laser Deposit R.Dietsch, T.Holz, H.Mai FhG IWS, Winterbergstr.28, D-01277 Dresden, Germany measurement has been carried out by PTB at BESSY (SX700)
C/Si 13.7 .34 25 80 25.6 23 Ion Beam Sputter Marius Grigonis Universite Laval, Quebec, Canada Marius Grigonis and Emile Knystautas Applied Optics 36, 2839 (1997)
Mo/B4C 8.2 0.50 61 45 11.1 23 Magnetron Sputter M Yamamoto Tohoku Univ., Japan
Mo/B4C 5 0.50 199 45 6.8 23 Magnetron Sputter M Yamamoto Tohoku Univ., Japan
Mo/B4C 4.9 0.39 100 45 6.7 23 Magnetron Sputter M Yamamoto Tohoku Univ., Japan
Mo/Sr 4.47 0.41 50 86.4 8.8 23 Magnetron Sputter Benjawan Sae-Lao LLNL Optics Letters, Vol. 26, No. 7 (April 2001)
Cr/Sc 1.63 0.47 600 73 3.117 22.8 Magnetron Sputter Fredrik Eriksson, Goran Johansson, Hans Hertz, Jens Birch Thin Film Physics, Linköping University, Sweden Measured 2001 at ALS by Eric Gullikson
Mo/C 8.4 0.50 51 45 11.6 22 Magnetron Sputter M Yamamoto Tohoku Univ., Japan
Mo/Y 4 0.42 100 85 7.87 21.3 Magnetron Sputter Claude Montcalm LLNL C.Montcalm, B.T.Sullivan, S.Duguay, M.Ranger, and others. Optics Letters, 15 June 1995, 20, 1450-2.
Co/C 7.95 0.395 70 33.17 4.35 21 Evaporate Ion Polish Salim Abdali Danish Space Research Institute DSRI, Denmark 1) S. Abdali et.al, Proc. SPIE, Vol. 2805, p.66 (1996) 2) S. Abdali et.al, Proc. SPIE, Vol. 3114, p.33 (1997)
CrB2/C 5.4 0.3 40 25 4.5 21 Magnetron Sputter Anatoliy I. Fedorenko KhSPU, Ukraine Annealed at 1000 C, 1 hour. E.Bugaev, A.Fedorenko, V.Kondratenko, E.Zubarev, Proc. of RSNE'97, Dubna-Moscow, May 25-29, 1997
Ni/C 4 0.30 75 35 4.4 21 Ion Beam Sputter Jim Wood, Y.Platonov Osmic, Inc.
Ru/B4C 5.4 0.50 199 51 6.7 21 Magnetron Sputter M Yamamoto Tohoku Univ., Japan
Os/Si 21.33 0.30 8 90 38 20 Evaporate Igor A. Artioukov FIAN-KhSPU I. V. Kozhevnikov, et al. Optics Communications 125 (1996) 13-17
Ni/C 6.04 0.255 20 23 4.8 20 Magnetron Sputter S. Di Fonzo, B. R. Mueller, W. Jark SINCROTRONE TRIESTE accepted for publication in Appl. Opt. J. Friedrich, I. Diel, C. Kunz, S. Di Fonzo, B. R. Mueller and W. Jark
C/Si 15.4 .33 25 78 28.3 20 Ion Beam Sputter Marius Grigonis Universite Laval, Quebec, Canada Marius Grigonis and Emile Knystautas Applied Optics 36, 2839 (1997)
Ru/B4C 3.4 0.41 150 85 6.8 20 Magnetron Sputter Jeff Kortright LBNL
Ru/B4C 3.6 0.39 150 89 7.2 20 Magnetron Sputter Daniel Stearns, Steve Vernon LLNL
Cr/Sc 1.74 0.47 400 63.5 3.12 19.8 Magnetron Sputter Fredrik Eriksson, Goran Johansson, Hans Hertz, Jens Birch Thin Film Physics, Linkoping University, Sweden Measured 2001 at ALS by Eric Gullikson
Cr/Sc 1.58 0.47 300 82.8 3.12 19.8 Magnetron Sputter Fredrik Eriksson, Jens Birch Thin Film Physics, Linkoping University, Sweden Measured 2002 at BESSY II. Oral presentation March 4, 2002, at the PXRMS'02 conference in Chamonix, France.
Ru/C 5 0.36 30 85 10.6 19 Evaporate Ion Polish Eric Louis FOM Inst. Plasma Phys., Netherlands
Co/C 4 0.38 80 35 4.5 19 Evaporate Ion Polish Eric Louis FOM Inst. Plasma Phys., Netherlands
Ru/B4C 4.9 0.39 100 43 6.7 19 Magnetron Sputter M Yamamoto Tohoku Univ., Japan
Cr/C 3.25 0.4 150 88 6.42 18.9 Magnetron Sputter Hisataka Takenaka NTT Measured at ALS 6.3.2
Ni/C 3.16 0.45 75 45.05 4.47 18.8 Pulsed Laser Deposit R.Dietsch, T.Holz, H.Mai FhG IWS, Winterbergstr. 28, D-01277 Dresden, Germany measurement has been carried out by PTB at BESSY (SX700)
Fe/C 3.11 0.4 100 44.8 4.39 18.3 Magnetron Sputter Hans Grimmer Paul Scherrer Institut Measured at BESSY, July 98, using a Ti filter to reduce the second harmonic
Co/C 14.3 0.40 20 16 7.3 18 Evaporate Eberhard Spiller Consultant
Mo/BN 8.8 0.50 51 45 12 18 Magnetron Sputter M Yamamoto Tohoku Univ., Japan
Cr/C 13.4 0.70 14 16 7.3 17 Evaporate Eberhard Spiller Consultant
Cr/Ti 1.384 0.4 400 81.5 2.74 17 Magnetron Sputter Farhad Salmassi, Eric Gullikson CXRO Measured July 2005 at ALS. Uses barrier layer.
RhRu/C 6 0.40 23 24 4.8 16 Evaporate Ion Polish Eberhard Spiller Consultant
FeCrNi/B4C 3.4 0.35 100 89 6.8 16 Magnetron Sputter Daniel Stearns, Steve Vernon LLNL
W/B4C 1.1 0.40 200 4 0.154 15 Magnetron Sputter Jim Wood, Y.Platonov Osmic, Inc.
Cr/Sc 1.56 0.4 400 85 3.11 15.0 Magnetron Sputter Thomas Kuhlmann, Sergey Yulin, Torsten Feigl, Norbert Kaiser Fraunhofer IOF Jena, Germany measured at PTB/BESSY II
Cr/Sc 1.73 .4 250 62.5 3.11 14.8 Ion Beam Sputter Masaki Yamamoto Tohoku University K. Sakano and M. Yamamoto, SPIE Proc. Vol. 3767, 238 (1999)
Cr/Sc 1.56 0.4 400 88.5 3.12 14.8 Magnetron Sputter Thomas Kuhlmann, Sergey Yulin, Torsten Feigl, Norbert Kaiser Fraunhofer IOF Jena, Germany measured at PTB/BESSY II
Co/C 2.29 0.5 200 85 4.56 14.8 Magnetron Sputter Igor Artyukov Lebedev Physical Institute/Kharkiv Polytechnic Institute I.A. Artyukov, Ye.Bugayev, O.Yu. Devizenko, et al. Proc. SPIE, Vol. 5919, pp. 94-103, 2005.
Cr/Sc 1.57 0.47 600 87.5 3.116 14.6 Magnetron Sputter Fredrik Eriksson, Goran Johansson, Hans Hertz, Jens Birch Thin Film Physics, Linköping University, Sweden Measured 2001 at ALS by Eric Gullikson
Ru/C 4.3 0.40 100 85 8.6 14 Magnetron Sputter Jeff Kortright LBNL
V/C 13.4 0.70 15 16 7.3 14 Evaporate Eberhard Spiller Consultant
Fe/C 14.3 0.40 20 16 7.3 14 Evaporate Eberhard Spiller Consultant
Ni/C 4.8 0.42 20 45 6.9 14 Magnetron Sputter M Yamamoto Tohoku Univ., Japan
Co/C 5.1 0.37 42 85 10.2 12.5 Evaporate Ion Polish Eric Louis FOM Inst. Plasma Phys., Netherlands
Ru/C 3.4 0.41 150 85 6.8 12 Magnetron Sputter Jeff Kortright LBNL
Co/C 4 0.38 80 85 7.8 12 Evaporate Ion Polish Eric Louis FOM Inst. Plasma Phys., Netherlands
Pd/B4C 5.8 0.47 50 85 8.5 12 Magnetron Sputter Claude Montcalm Nat. Res. Council Canada and INRS-Energy and Materials and Univ. Arizona C. Montcalm, P.A. Kearney, J.M. Slaughter, B.T. Sullivan, M. Chaker and C.M. Falco, "Survey of Ti-, B- and Y-based soft-x-ray/extreme-ultraviolet multilayer mirrors for the 2 to 13 nm wavelength region," Appl. Opt. 35, 5134-5147 (1996).
W/Si 1.45 0.31 450 3 0.154 12 Magnetron Sputter B.Vidal Facult des Sciences de St. Jerome, France
Co/C 3.02 0.45 41 46.7 4.39 12.0 Magnetron Sputter Hans Grimmer Paul Scherrer Institut Measured at BESSY, July 98, using a Ti filter to reduce the second harmonic
Cr/C 2.25 0.4 150 85 4.47 11.5 Magnetron Sputter Salashchenko Shamov IPM RAS
C/Ti 2.7 0.4 85 31 2.77 11 Evaporate Ion Polish Ulf Kleineberg University of Bielefeld H.-J. Stock, G. Haindl, F. Hamelmann, D. Menke, O. Wehmeyer, U. Kleineberg, U. Heinzmann, P. Bulicke, D. Fuchs, G. Ulm Appl. Optics 37 (25), 6002 (1998)
Cr/C 4.48 0.333 50 76.3 8.6 10.85 Magnetron Sputter Werner Jark Sincrotrone Trieste
Cr/C 3.25 0.333 100 74.6 6.2 10 Magnetron Sputter Werner Jark Sincrotrone Trieste
ReW/C 10 0.30 7 89 20 10 Evaporate Eberhard Spiller Consultant
Mo/B4C 3.4 0.38 150 89 6.7 10 Magnetron Sputter Daniel Stearns, Steve Vernon LLNL
Ni/C 4.5 0.47 20 33.7 4.8 9.8 Magnetron Sputter S. Di Fonzo, B. R. Mueller, W. Jark SINCROTRONE TRIESTE accepted for publication in Appl. Opt. J. Friedrich, I. Diel, C. Kunz, S. Di Fonzo, B. R. Mueller and W. Jark
W/B4C 1.4 0.40 75 3.1 0.154 9.8 Magnetron Sputter Jeff Kortright LBNL
Mo/B 3.4 0.41 100 85 6.7 9.4 Magnetron Sputter Claude Montcalm, H. Pepin Natl. Res. Council Canada and INRS-Energy and Materials C. Montcalm, P.A. Kearney, J.M. Slaughter, B.T. Sullivan, M. Chaker and C.M. Falco, "Survey of Ti-, B- and Y-based soft-x-ray/extreme-ultraviolet multilayer mirrors for the 2 to 13 nm wavelength region," Appl. Opt. 35, 5134-5147 (1996).
Cr/V 1.218 0.4 600 84 2.423 9.1 Magnetron Sputter Farhad Salmassi, Eric Gullikson CXRO Measured July 2005 at ALS. Uses barrier layer.
Co/C 3.2 0.41 75 89 6.4 8.5 Evaporate Ion Polish Eberhard Spiller Consultant
W/Ti 2.8 0.3 60 29 2.8 8.0 Magnetron Sputter Hans Grimmer Paul Scherrer Institut H.Ch. Mertins, F. Schaefers, H. Grimmer, D. Clemens, P. Boeni, M. Horisberger, Applied Optics 37 (1998) 1873-1882
Al2O3/V 4.36 0.43 40 16 2.3 8 Magnetron Sputter M. Veldkamp, H. Zabel, F. Schaefers, H.-Ch. Mertins Ruhr-Universitaet Bochum, Lehrstuhl fuer Experimentalphysik/Festkoerperphysik, Universitaetsstr. 150, D-44780 Bochum Measurement taken at BESSY PM4 Submitted to Appl. Optics
W/C 2.6 0.3 75 87 5.2 7.9 Magnetron Sputter Hans Grimmer Paul Scherrer Institut H.Ch. Mertins, F. Schaefers, H. Grimmer, D. Clemens, P. Boeni, M. Horisberger, Applied Optics 37 (1998) 1873-1882.
V/C 2.3 0.43 200 80 4.6 7.9 Magnetron Sputter Jim Wood, Y.Platonov Osmic, Inc.
Cr/Sc 2.39 0.4 200 70.6 4.48 7.1 Magnetron Sputter Sergey Yulin, Thomas Kuhlmann, Torsten Feigl, Norbert Kaiser Fraunhofer IOF Jena, Germany measured at PTB/BESSY II
Cr/C 2.4 0.42 150 85 4.8 7 Magnetron Sputter Jeff Kortright LBNL
Ni/V 1.73 0.4 150 44.5 2.43 6.8 Magnetron Sputter Hans Grimmer Paul Scherrer Institut Measured at BESSY, April 98, using a Fe filter to reduce the second harmonic
W/B4C 8 0.50 61 45 10.7 6.6 Magnetron Sputter M Yamamoto Tohoku Univ., Japan
Cr/C 3.2 0.31 100 80 6.2 6 Magnetron Sputter Franz Schaefers BESSY, Germany
Cr/C 2.3 0.32 100 85 4.6 6 Magnetron Sputter Jim Underwood LBNL
NiCr/C 2.3 0.32 50 85 4.6 6 Magnetron Sputter Jim Underwood LBNL
W/C 2.3 0.3 75 87 4.5 5.9 Magnetron Sputter Hans Grimmer Paul Scherrer Institut H.Ch. Mertins, F. Schaefers, H. Grimmer, D. Clemens, P. Boeni, M. Horisberger, Applied Optics 37 (1998) 1873-1882
Ni/Ti 2.04 0.4 75 42.3 2.75 5.9 Magnetron Sputter Hans Grimmer Paul Scherrer Institut Measured at BESSY, April 98, using a Fe filter to reduce the second harmonic
Cr/C 3.25 0.333 50 85 6.46 5.9 Magnetron Sputter Werner Jark Sincrotrone Trieste
Ni/Ti 2.4 0.3 100 35 2.7 5.8 Magnetron Sputter Hans Grimmer Paul Scherrer Institut H.Ch. Mertins, F. Schaefers, H. Grimmer, D. Clemens, P. Boeni, M. Horisberger, Applied Optics 37 (1998) 1873-1882.
Al2O3/C 3.02 0.48 40 52 4.36 5.6 Magnetron Sputter M. Veldkamp, H. Zabel, F. Schaefers, H.-Ch. Mertins Ruhr-Universitaet Bochum, Lehrstuhl fuer Experimentalphysik/Festkoerperphysik, Universitaetsstr. 150, D-44780 Bochum, Germany Measurement taken at BESSY PM4 Submitted to Appl. Optics
W/Ti 2.7 0.26 60 29 2.8 5.2 Magnetron Sputter Claude Montcalm Nat. Res. Council Canada and INRS-Energy and Materials and Univ. Arizona C. Montcalm, P.A. Kearney, J.M. Slaughter, B.T. Sullivan, M. Chaker and C.M. Falco, "Survey of Ti-, B- and Y-based soft-x-ray/extreme-ultraviolet multilayer mirrors for the 2 to 13 nm wavelength region," Appl. Opt. 35, 5134-5147 (1996).
Ge/C 2.3 0.36 200 89 4.6 5 Magnetron Sputter Jim Underwood LBNL
FeCrNi/C 2.3 0.32 50 85 4.6 5 Magnetron Sputter Jim Underwood LBNL
Ru/C 2.3 0.39 150 85 4.6 4.5 Magnetron Sputter Jeff Kortright LBNL
Cr/Ti 2.04 0.5 150 45 2.741 4.3 Magnetron Sputter Naureen Ghafoor, Fredrik Eriksson, Franz Schäfers, Jens Birch Thin Film Physics, Linköping University,Sweden Measured 2003 at BESSY II
W/BN 9.2 0.50 61 45 12.2 4.2 Magnetron Sputter M Yamamoto Tohoku Univ., Japan
Co2C3/C 2.3 0.32 100 85 4.6 4 Magnetron Sputter Jim Underwood LBNL
Ru/C 2.55 0.40 20 1.74 0.1542 3.8 Magnetron Sputter Chris Walton LBNL unpublished
W/C 7.6 0.50 51 45 10.5 3.6 Magnetron Sputter M Yamamoto Tohoku Univ., Japan
W/Sc 1.60 0.32 130 83 3.18 3. Magnetron Sputter Igor A. Artioukov FIAN-KhSPU I. V. Kozhevnikov et al. Nucl. Instrum. and Meth. A 345 (1994) 594-603
Mo/C 4.4 0.50 151 35 7.3 2.9 Magnetron Sputter M Yamamoto Tohoku Univ., Japan
W/B4C 2.2 0.32 250 89 4.2 2.8 Magnetron Sputter Jim Wood, Y.Platonov Osmic, Inc.
Ni/V 1.22 0.45 500 88 2.43 2.7 Magnetron Sputter Fredrik Eriksson, Jens Birch Thin Film Physics, Linkoping University, Sweden Measured 2002 at ALS by Eric Gullikson
Ni/Ti 1.9 0.3 75 49 2.8 2.5 Magnetron Sputter Hans Grimmer Paul Scherrer Institut H.Ch. Mertins, F. Schaefers, H. Grimmer, D. Clemens, P. Boeni, M. Horisberger, Applied Optics 37 (1998) 1873-1882
Co/C 2.4 0.37 80 85 4.8 2.5 Evaporate Ion Polish Eric Louis FOM Inst. Plasma Phys., Netherlands
Cr/Ti 1.379 0.5001 100 78.8 2.741 2.1 Magnetron Sputter Naureen Ghafoor, Fredrik Eriksson, Franz Schäfers, Jens Birch Thin Film Physics, Linköping University,Sweden Measured 2003 at BESSY II
Ni/V 1.7 0.3 50 46 2.45 2.0 Magnetron Sputter Hans Grimmer Paul Scherrer Institut H.Ch. Mertins, F. Schaefers, H. Grimmer, D. Clemens, P. Boeni, M. Horisberger, Applied Optics 37 (1998) 1873-1882
W/B4C 1.7 0.41 200 85 3.4 1.9 Magnetron Sputter Jim Wood, Y.Platonov Osmic, Inc.
W/Ti 1.4 0.3 60 2.8 1.7 Magnetron Sputter Hans Grimmer Paul Scherrer Institut H.Ch. Mertins, F. Schaefers, H. Grimmer, D. Clemens, P. Boeni, M. Horisberger, Applied Optics 37 (1998) 1873-1882.
W/B4C 1.14 0.40 75 3.9 0.154 1.6 Magnetron Sputter Jeff Kortright LBNL
Materials d(nm) Gamma N Grazing Angle (deg) lambda (nm) R(%) Deposition Contact Affiliation Reference

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